Scanning Electron Microscope

Aluminium on Titanium microstructure

Description of facility

The Zeiss Ultra 55 scanning electron microscope equipped with a field emission gun is our "working horse" in solving structural and analytical questions on a microscopic scale.

Four different electron detectors are available for image recording:

  • Conventional secondary electron detector for topographic contrast, atomic ("z"-) contrast (in case of light and intermediate elements) and orientation contrast
  • In-lens secondary electron detector for better z-contrast by suppression of topographic contrasts
  • Backscatter detector for distinct z-contrast, especially in case of intermediate and heavy elements
  • In-lens back scatter detector for z-contrast even at low acceleration voltages

The scanning electron microscope is equipped with an EDX system which allows quantification of elements with z>4 (Be). Microscope control by means of the EDX software enables semi-automatic long-term analyses (e.g. serial analyses or high resolution mappings). Additionally, an EBSD system for identifying the phases present due to crystallographic properties is installed.


  • Schottky field emission gun
  • Resolution 1 nm at 15 keV, 1.7 nm at 1.7 keV and even 4 nm at 0.1 keV acceleration voltage
  • Secondary electron detector, angle selective BSE-Detector (ASB-Detector)
  • In-lens SE-Detector and In-lens BSE-Detector
  • Oxford INCA EDX- System
  • Oxford Channel5 / Nordlys II EBSD-System.


  • Scanning electron microscope, equipped with EDX
  • Semi-automatic long-term analyses
  • EBSD system for identifying phases

Institute / Organization

DLR Institute of Materials Research


Dr. Klemens Kelm
DLR Institute of Materials Research

Jochen Krampe
Technology Marketing